THIN FILM ANALYSIS & MATERIAL SCIENCE
tec5USA Equipment Applications for Thin Film Analysis
Provide real-time insights into your process
Chemical vapor deposition is a technique which a volatile material is vaporized within a chamber to either decompose or chemically react with another vapor and deposit the product onto a target (i.e. substrate). The deposited material is engineered for various purposes, from metal materials for conductivity to insulators or semiconductors
Chemical Vapor Deposition Process Monitoring
The CVD process can be monitored in-situ or at-line. For in-situ monitoring, the pressure of the reactants can typically be measured via UV/Vis spectroscopy. The absorption strength of the gasses can be directedly correlated to the pressure of each. With the pressure feedback from the spectrometer system, the stability of the gas can be maintained, or rapidly corrected, which then corresponds to a higher accuracy of deposition on the substrate.
At-line monitoring of the deposition process can be performed using tec5USA systems via white light interference. This measurement technique provides the film thickness of deposited layers on the substrate.
